CMOS Chip Planarization by Chemical Mechanical Polishing for a Vertically Stacked Metal MEMS Integration

H. Lee, Michele Miller, T. G. Biffano

Research output: Contribution to journalArticlepeer-review

Original languageAmerican English
JournalJournal of Micromechanics and Microengineering
Volume14
DOIs
StatePublished - Jan 1 2004

Disciplines

  • Engineering

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